The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2002
Filed:
Feb. 28, 2000
Tatsushi Kaneko, Naka Kubiki-gun, JP;
Kenji Koizumi, Naka Kubiki-gun, JP;
Satoshi Watanabe, Naka Kubiki-gun, JP;
Yoshitaka Yanagi, Naka Kubiki-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
There are disclosed a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound, and a patterning method comprising a step of application of a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound to a substrate, a step of, after a heat treatment, exposure with a high energy ray having a wavelength of 500 nm or less, X-ray or electron ray through a photomask, and a step of development with a developer. According to the present invention, there are provided a photoresist composition exhibiting excellent stability as for sensitivity against long term storage and environmental temperature variation, and a patterning method utilizing the photoresist composition.