The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2007

Filed:

May. 11, 2004
Applicants:

Youichi Ohsawa, Niigata-ken, JP;

Katsuhiro Kobayashi, Niigata-ken, JP;

Tatsushi Kaneko, Niigata-ken, JP;

Inventors:

Youichi Ohsawa, Niigata-ken, JP;

Katsuhiro Kobayashi, Niigata-ken, JP;

Tatsushi Kaneko, Niigata-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/031 (2006.01);
U.S. Cl.
CPC ...
Abstract

Photoacid generators have formula (1) wherein Rand Rare alkyl, or Rand R, taken together, may form a C–Cring structure with sulfur, R is hydrogen or alkyl, R' is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Yis alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness


Find Patent Forward Citations

Ohsawa, Youichi. (2007). Photoacid generators, chemically amplified resist compositions, and patterning process (U.S. Patent No. 7235343). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7235343

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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