Tokyo, Japan

Tatsuo Itagaki


Average Co-Inventor Count = 6.3

ph-index = 5

Forward Citations = 236(Granted Patents)


Location History:

  • Hinode, JP (1991)
  • Tokyo, JP (1991 - 1992)

Company Filing History:


Years Active: 1991-1992

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5 patents (USPTO):Explore Patents

Title: Innovations of Tatsuo Itagaki

Introduction

Tatsuo Itagaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on advanced methods and apparatuses for sputtering and integrated circuit devices.

Latest Patents

One of his latest patents is a method of and apparatus for sputtering, which involves a thin film forming method where a negative voltage is applied alternately to a target and a substrate. This innovative approach allows for film formation and reverse sputtering to occur alternately. A coil is mounted between the target and the substrate, generating plasma through a high-frequency current. This method enables the application of a negative base voltage smaller in absolute value than that during sputtering, allowing Ar ions to flow into the substrate during reverse sputtering. This results in a film with a step coverage of 0.3 or more, maintaining stable discharge and enabling reverse sputtering in a high vacuum region. The pressure of the Ar atmosphere can be lowered to 10-3 Torr or less, facilitating the creation of an aluminum wiring film with a peak value of x-ray diffraction strength at a (111) plane of 150 Kcps or more.

Another significant patent involves a semiconductor integrated circuit device and the process for producing it. As semiconductor devices shrink in size, resistance at the contact portions of metal interconnections increases, leading to contact failures. This invention presents a novel interconnection structure that includes a barrier metal layer formed under the metal interconnection. This structure isolates the electrode portions of the elements and interconnection portions from the semiconductor substrate, while the electrode lead-out portions for external connection are formed directly on the interlayer insulating layer.

Career Highlights

Tatsuo Itagaki has worked with notable companies such as Hitachi, Ltd. and Hitachi Microcomputer Engineering, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

He has collaborated with esteemed colleagues, including Jin Onuki and Yasushi Koubuchi, further enhancing his contributions to the field.

Conclusion

Tatsuo Itagaki's innovative work in semiconductor technology and his numerous patents highlight his significant impact on the industry. His advancements in sputtering methods and integrated circuit devices continue to

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