Tokyo, Japan

Tasuku Yano

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2010-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tasuku Yano. Retrieved from https://idiyas.com/inventor/tasuku-yano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 80.0

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Kokubunji, JP (2010 - 2011)
  • Hitachi, JP (2014)
  • Tokyo, JP (2016 - 2017)

Company Filing History:


Years Active: 2010-2017

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5 patents (USPTO):Explore Patents

Title: Innovations of Tasuku Yano in Scanning Electron Beam Technology

Introduction

Tasuku Yano is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of scanning electron beam technology. With a total of five patents to his name, Yano has made remarkable advancements that enhance the precision and functionality of charged particle beam apparatuses.

Latest Patents

One of Yano's latest patents is a scanning electron beam device with focus adjustment based on acceleration voltage. This innovative device features a deflector for directing the electron beam emitted from an electron source, an objective lens for converging the beam, and a stage for placing a wafer. The controller in this device allows for both rough and fine adjustments of focus, depending on the acceleration voltage and the height of the wafer. This technology enables highly accurate measurements of both the upper and lower parts of grooves or holes with high aspect ratios.

Another notable patent is for a charged particle beam apparatus designed to reduce deflecting coma aberration during wide field-of-view scanning. This apparatus includes an electromagnetic objective lens and a sample stage, which work together to improve the quality of imaging and measurement.

Career Highlights

Yano's career is marked by his role at Hitachi High-Technologies Corporation, where he has been instrumental in developing advanced technologies in electron beam applications. His work has not only contributed to the company's reputation but has also pushed the boundaries of what is possible in the field of electron microscopy.

Collaborations

Throughout his career, Yano has collaborated with notable colleagues such as Yasunari Sohda and Muneyuki Fukuda. These partnerships have fostered an environment of innovation and have led to the successful development of cutting-edge technologies.

Conclusion

Tasuku Yano's contributions to scanning electron beam technology exemplify the spirit of innovation in the field of electronics. His patents reflect a deep understanding of the complexities involved in electron beam applications, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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