The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
Aug. 12, 2008
Applicants:
Zhaohui Cheng, Tokyo, JP;
Tasuku Yano, Kokubunji, JP;
Seiko Omori, Kokubunji, JP;
Inventors:
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A charged particle beam device including a function for measuring localized static charges on a sample. A primary charged particle beam scans a sample positioned in a mirror state to acquire an image. The acquired image may be an image of the sample or may be an image of a structural component in the charged particle optical system. The acquired image is compared with a standard sample image and the localized static charge is measured.
Quick Actions:
Cheng, Zhaohui. (2011). Localized static charge distribution precision measurement method and device (U.S. Patent No. 7928384). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7928384
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