The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Apr. 18, 2013
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Yasunari Sohda, Tokyo, JP;
Tasuku Yano, Tokyo, JP;
Muneyuki Fukuda, Tokyo, JP;
Noritsugu Takahashi, Tokyo, JP;
Hajime Kawano, Tokyo, JP;
Hiroyuki Ito, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.