Tan-Fu Lei

Title: Innovations of Tan-Fu Lei

Introduction

Tan-Fu Lei is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor cleaning processes, holding a total of 8 patents. His work focuses on improving the efficiency and effectiveness of cleaning methods used in semiconductor manufacturing.

Latest Patents

Among his latest patents, Tan-Fu Lei has developed solutions and processes for the removal of sidewall residue after dry etching. This invention addresses the challenges faced in conventional methods, which often fail to completely remove photoresist and sidewall residues. By incorporating fluorine-containing compounds, such as hydrogen fluoride and ammonium fluoride, into sulfuric acid, his process achieves complete removal without the need for additional strippers. Furthermore, he has created a solution for cleaning silicon semiconductors or silicon oxides, which combines hydrogen peroxide, hydroxylamine, and other selected components. This innovative solution effectively removes contaminants while avoiding the use of strong acids.

Career Highlights

Tan-Fu Lei has worked with notable organizations, including the National Science Council and Merck Patent Gesellschaft. His experience in these institutions has contributed to his expertise in the field of semiconductor technology and patent development.

Collaborations

Throughout his career, Tan-Fu Lei has collaborated with esteemed colleagues, including Chung-Len Lee and Chun-Yen Chang. These partnerships have fostered innovation and advancement in their shared field of expertise.

Conclusion

Tan-Fu Lei's contributions to semiconductor cleaning processes and his innovative patents highlight his significant role as an inventor. His work continues to influence the industry and improve manufacturing practices.