Takuya Komine

Title: Takuya Komine: Innovator in Photosensitive Resin Technology

Introduction

Takuya Komine is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 2 patents. His work focuses on developing advanced materials and methods that enhance the performance of semiconductor devices.

Latest Patents

Takuya Komine's latest patents include a photosensitive resin composition and a method for selecting this composition. His innovative method involves exposing a resin film of a photosensitive resin composition at energy levels ranging from 100 to 2000 mJ/cm². Following this exposure, the resin film is heat-treated at temperatures between 150° C. and 250° C. for 1 to 3 hours under nitrogen. This process results in a strip sample of a cured film with a thickness of 10 μm and a width of 10 mm. Additionally, he has developed an adhesive composition that includes a (meth)acrylic polymer, a compound with at least two (meth)acryloyl groups, a polymerization initiator, and a filler.

Career Highlights

Throughout his career, Takuya Komine has worked with notable companies such as Showa Denko Materials Co., Ltd. and Resonac Corporation. His expertise in photosensitive resin technology has positioned him as a key figure in the development of materials used in semiconductor manufacturing.

Collaborations

Takuya has collaborated with esteemed colleagues, including Sadaaki Katou and Shinjiro Fujii. These partnerships have contributed to the advancement of innovative solutions in the field of materials science.

Conclusion

Takuya Komine's contributions to photosensitive resin technology and his innovative methods have made a significant impact on the semiconductor industry. His work continues to influence advancements in material science and engineering.