Nirasaki, Japan

Takeshi Ohse


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 487(Granted Patents)


Location History:

  • Nirasaki, JP (2012 - 2014)
  • Miyagi, JP (2014)
  • Niarasaki, JP (2014)
  • Yamanashi, JP (2017)
  • Sendai, JP (2018)
  • Yamanashi-ken, JP (2019)

Company Filing History:


Years Active: 2012-2019

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8 patents (USPTO):

Title: The Innovative Contributions of Takeshi Ohse

Introduction

Takeshi Ohse, an accomplished inventor based in Nirasaki, Japan, has made significant strides in the field of substrate processing technology. With a total of eight patents to his name, he has contributed valuable advancements that enhance the efficiency of semiconductor manufacturing processes.

Latest Patents

Ohse's latest patents include a substrate processing apparatus and a substrate processing method which aim to effectively reduce voltage changes of a substrate on an electrode. This innovation minimizes the variation of incident energy of ions entering the substrate. The apparatus comprises a first electrode that holds the substrate, a second electrode facing the first, an RF power source that applies a voltage of 40 MHz or higher, and a pulse voltage applying unit that superimposes a decreasing pulse voltage on the RF voltage over time.

Another notable patent is the connection control method within a substrate processing apparatus that features a depressurized processing room. This system includes a susceptor for wafer mounting, a high frequency power supply for plasma generation, a low frequency power supply for bias voltage generation, and a DC voltage applying unit for better processing controllability during etching processes. The connection control method is designed to manage the connection and disconnection between the susceptor and both high frequency power supplies when plasma is generated.

Career Highlights

Throughout his career, Takeshi Ohse has been associated with leading technology companies such as Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His work at these firms has allowed him to innovate in critical areas of semiconductor technology.

Collaborations

Ohse’s career is also marked by collaborations with esteemed colleagues including Shinji Himori and Jun Abe. These partnerships have facilitated the sharing of ideas and spurred further innovation in substrate processing methods.

Conclusion

In conclusion, Takeshi Ohse stands out as an influential inventor in the semiconductor industry. His patents not only showcase his technical skills but also his commitment to advancing technology that improves manufacturing processes. With continued innovation, Ohse is likely to remain a pivotal figure in this field.

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