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For the Inventor, By the Inventor

Yokohama, Japan

Takeshi Koshiba

This inventor holds 10 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2008-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Koshiba. Retrieved from https://idiyas.com/inventor/takeshi-koshiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 60.0

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 15(Granted Patents)


Location History:

  • Mie, JP (2012 - 2014)
  • Yokohama, JP (2008 - 2016)
  • Mie-ken, JP (2013 - 2016)

Company Filing History:

goldMedal10 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2008-2016

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10 patents (USPTO):Explore Patents
1. 9389513 - Method of forming pattern, system for calculating resist coating distribution and program for calculating the same (2016-07-12),
2. 9381540 - Pattern forming method (2016-07-05),
3. 9046763 - Pattern forming method (2015-06-02),
4. 8907346 - Imprint apparatus, imprint method, and manufacturing method of semiconductor device (2014-12-09),
5. 8423926 - Acceptance determining method of blank for EUV mask and manufacturing method of EUV mask (2013-04-16),
6. 8178366 - Pattern forming method, manufacturing method of semiconductor device, and template manufacturing method (2012-05-15),
7. 7985958 - Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program (2011-07-26),
8. 7889910 - Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program (2011-02-15),
9. 7482604 - Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device (2009-01-27),
10. 7459705 - Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device (2008-12-02),

Title: **Innovative Contributions of Takeshi Koshiba in Pattern Formation**

Introduction

Takeshi Koshiba, an accomplished inventor based in Yokohama, Japan, has made significant strides in the field of pattern formation with a portfolio that includes ten patents. His innovative work, particularly in the area of resist pattern technology, showcases his commitment to advancing the capabilities of modern manufacturing processes.

Latest Patents

Among his latest patents are groundbreaking methods focused on improving resist pattern formation. One notable patent describes a method for forming a resist pattern on a substrate, which involves obtaining information from a template pattern and setting a resist coating distribution derived from this information. The process entails forming a resist on a substrate, allowing it to fill a template pattern, and curing it to create a solid resist pattern. Another significant patent introduces a method that determines the amount of curable resin to be applied, taking into account the volatility of the resin and calculating for each region of the substrate. This method emphasizes precision in coating that ensures the quality of the final patterns.

Career Highlights

Takeshi Koshiba's career is marked by numerous innovations in the manufacturing sector, particularly while working at Toshiba Corporation. His expertise in resist technology has been instrumental in the development of advanced manufacturing techniques that cater to the needs of modern industries. With ten patents to his name, Koshiba continues to push the boundaries of what is possible in pattern formation and resist applications.

Collaborations

Throughout his career, Takeshi Koshiba has collaborated with talented colleagues such as Tetsuro Nakasugi and Takumi Ota. These partnerships have fostered a dynamic and innovative environment at Toshiba, enabling the development of high-quality technologies that impact various sectors.

Conclusion

Takeshi Koshiba stands out as a pioneering inventor in his field, with influential contributions that resonate within the technological landscape. As he continues to develop new inventions and refine existing technologies, his work will undoubtedly play a significant role in shaping the future of pattern formation processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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