The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Sep. 10, 2010
Applicant:
Takeshi Koshiba, Mie-ken, JP;
Inventor:
Takeshi Koshiba, Mie-ken, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G06F 17/50 (2013.01);
Abstract
In one embodiment, a method of forming a resist pattern on a substrate is provided. Information of a template pattern formed on a template based on template pattern data is obtained. A resist coating distribution is set based on the information of the template pattern. A resist is formed on a substrate based on the resist coating distribution. The template is brought into contact with the resist formed on the substrate so that the resist is filled into the template pattern formed on the template. The filled resist is cured. The template is separated from the cured resist so that a resist pattern is formed on the substrate.