Takeshi Ibe

Title: Innovations of Takeshi Ibe

Introduction

Takeshi Ibe is a prominent inventor based in Sakura, Japan. He has made significant contributions to the field of photo-imprinting technology. With a total of five patents to his name, Ibe continues to push the boundaries of innovation in his industry.

Latest Patents

One of Ibe's latest patents is a photo-imprinting curable composition and pattern transferring method. The invention aims to provide an imprinting curable composition that includes a silicon-containing polymerizable compound, such as polysiloxane. This composition exhibits outstanding adhesion to substrates and excellent demoldability from fine pattern molds, while causing minimal mold contamination. The composition includes a polymerizable compound containing a silicon atom, a photopolymerization initiator, and an additive represented by specific chemical formulas. Another notable patent is a curable composition for imprinting, which contains a polymerizable compound with specific concentration ranges and viscosity parameters, ensuring optimal performance in imprinting applications.

Career Highlights

Takeshi Ibe is currently employed at Dic Corporation, where he continues to develop innovative solutions in the field of polymer technology. His work has garnered attention for its practical applications and advancements in manufacturing processes.

Collaborations

Ibe collaborates with notable coworkers, including Makoto Yada and Hisashi Tanimoto. Their combined expertise contributes to the success of their projects and the advancement of their technologies.

Conclusion

Takeshi Ibe's contributions to the field of photo-imprinting technology highlight his innovative spirit and dedication to advancing polymer science. His patents reflect a commitment to improving manufacturing processes and enhancing product quality.