The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Dec. 17, 2014
Applicant:
Dic Corporation, Tokyo, JP;
Inventors:
Takeshi Ibe, Sakura, JP;
Makoto Yada, Sakura, JP;
Assignee:
DIC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); C08F 12/36 (2006.01); H01L 21/311 (2006.01); C08F 12/34 (2006.01); C08F 257/00 (2006.01); C08K 5/00 (2006.01); C08L 101/02 (2006.01); C08F 12/32 (2006.01); C09D 125/16 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C08F 12/36 (2013.01); B29C 59/026 (2013.01); C08F 12/32 (2013.01); C08F 12/34 (2013.01); C08F 257/00 (2013.01); C08K 5/00 (2013.01); C08L 101/02 (2013.01); C09D 125/16 (2013.01); G03F 7/0002 (2013.01); H01L 21/31144 (2013.01); B81C 2201/0153 (2013.01);
Abstract
Provided is a curable resin composition for a dry-etching resist, the curable resin composition containing a polymer (A) having, in a side chain, a particular structure including an aromatic group having a vinyl group. The polymer (A) includes 80 to 100 wt % of the particular structure. In addition, provided are a dry-etching resist mask obtained by curing the curable composition for a dry-etching resist, and the dry-etching resist mask having a pattern formed by a nanoimprint method.