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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11226553 B1

PDFFull Text
Date of Patent:
Jan. 18, 2022

Filed:

Apr. 25, 2017

Photo-imprinting curable composition and pattern transferring method using the same

Applicant:

Dic Corporation, Tokyo, JP;

Inventors:

Takeshi Ibe, Sakura, JP;

Makoto Yada, Sakura, JP;

Assignee:

DIC Corporation, Tokyo, JP;

Attorneys:

Locke Lord LLP

James E. Armstrong, IV

Nicholas J. DiCeglie, Jr.

Primary Examiner:

Robert S Loewe

Int. Cl.
CPC ...
G03F 7/00 (2006.01); C08F 283/12 (2006.01); C08F 2/48 (2006.01); C08L 83/10 (2006.01); G03F 7/027 (2006.01); G03F 7/075 (2006.01); C08F 299/08 (2006.01); C08L 53/00 (2006.01); H01L 21/027 (2006.01); C08F 220/20 (2006.01); C08F 212/14 (2006.01); C08F 220/58 (2006.01); C08F 226/02 (2006.01); C08G 77/442 (2006.01); C08F 222/38 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C08F 2/48 (2013.01); C08F 283/126 (2013.01); C08F 299/08 (2013.01); C08L 53/00 (2013.01); C08L 83/10 (2013.01); G03F 7/027 (2013.01); G03F 7/0755 (2013.01); H01L 21/0271 (2013.01); C08F 212/14 (2013.01); C08F 220/20 (2013.01); C08F 220/281 (2020.02); C08F 220/58 (2013.01); C08F 222/385 (2013.01); C08F 226/02 (2013.01); C08G 77/442 (2013.01);
Abstract

An object of the present invention is to provide an imprinting curable composition which includes a silicon-containing polymerizable compound such as polysiloxane, exhibits outstanding adhesion to a substrate and excellent demoldability from a fine pattern mold, and causes very little mold contamination. The object is attained by providing a photo-imprinting curable composition including a polymerizable compound (A) containing a silicon atom in the molecule, a photopolymerization initiator (B) and an additive (C), the additive (C) being a compound represented by the following formula (C1) or (C2):ROCHOX  (C1)XOCHOCHOCHOX  (C2) (In the formula (C1), Ris a Calkyl group, Xis a hydrogen atom or an acyl group, and n is an integer of 0 to 50. In the formula (C2), Xand Xare each independently a hydrogen atom or an acyl group, and p, q and r are each independently an integer of 1 to 50).

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