Ehime, Japan

Takeshi Aoki

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Sumitomo Chemical Company, Limited, National Institute of Advanced Industrial Science and Technology, The University of Tokyo. Active years: 2014-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Aoki. Retrieved from https://idiyas.com/inventor/takeshi-aoki-bfr3dy3g

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Tsukuba, JP (2014)
  • Ehime, JP (2017)

Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):Explore Patents

Title: Innovations of Takeshi Aoki in Semiconductor Technology

Introduction

Takeshi Aoki is a prominent inventor based in Ehime, Japan, known for his contributions to semiconductor technology. He holds two patents that showcase his innovative approach to producing semiconductor wafers and electronic devices. His work has significantly impacted the field, particularly in the development of advanced materials and methods.

Latest Patents

Aoki's latest patents include a semiconductor wafer and a method of producing a semiconductor wafer and electronic device. The first patent aims to provide a semiconductor wafer that consists of a base wafer, a compound semiconductor layer, a first insulating layer, and a second insulating layer. In this design, oxygen and nitrogen atoms are continuously distributed in the depth direction, with the maximum number of nitrogen atoms found in the first insulating layer. Additionally, the total number of third and fourth atoms is largest in the compound semiconductor layer, while the number of oxygen atoms at the interface between the compound semiconductor layer and the first insulating layer is less than that at the interface between the first and second insulating layers.

The second patent focuses on a semiconductor wafer that includes a base wafer, a first insulating layer, and a semiconductor layer. The arrangement of these layers is crucial, with the first insulating layer made of an amorphous metal oxide or an amorphous metal nitride. The semiconductor layer consists of a first crystal layer and a second crystal layer, with the first crystal layer positioned closer to the base wafer. Notably, the electron affinity of the first crystal layer is greater than that of the second crystal layer.

Career Highlights

Throughout his career, Aoki has worked with notable organizations, including Sumitomo Chemical Company, Limited and The University of Tokyo. His experience in these institutions has allowed him to refine his expertise in semiconductor technology and contribute to various research projects.

Collaborations

Aoki has collaborated with esteemed colleagues such as Noboru Fukuhara and Hiroyuki Sazawa. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of semiconductor research.

Conclusion

Takeshi Aoki's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative approaches continue to influence advancements in electronic devices and materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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