Sumitomo Chemical Company, Limited

National Institute of Advanced Industrial Science and Technology

The University of Tokyo

Takeshi Aoki

Noboru Fukuhara

Shinichi Takagi

Masahiko Hata

Masafumi Yokoyama

Hisashi Yamada

Mitsuru Takenaka

Tetsuji Yasuda

Hiroyuki Sazawa

SangHyeon Kim

To provide a semiconductor wafer having a wafer, a compound semiconductor layer, a first insulating layer and a second insulating layer, wherein in the depth direction, oxygen atoms and nitrogen atoms are continuously distributed, the number of the nitrogen atoms along the depth direction shows its maximum in the first insulating layer, the total number of third atoms and fourth atoms along the depth direction becomes the largest in the compound semiconductor layer, the number of the oxygen atoms at the interface between the compound semiconductor layer and the first insulating layer is smaller than the number of the oxygen atoms at the interface between the first insulating layer and the second insulating layer.

Semiconductor wafer, method of producing semiconductor wafer and electronic device

Provided is a semiconductor wafer including a base wafer, a first insulating layer, and a semiconductor layer. Here, the base wafer, the first insulating layer and the semiconductor layer are arranged in an order of the base wafer, the first insulating layer and the semiconductor layer, the first insulating layer is made of an amorphous metal oxide or an amorphous metal nitride, the semiconductor layer includes a first crystal layer and a second crystal layer, the first crystal layer and the second crystal layer are arranged in an order of the first crystal layer and the second crystal layer in such a manner that the first crystal layer is positioned closer to the base wafer, and the electron affinity Eof the first crystal layer is larger than the electron affinity Eof the second crystal layer.

Semiconductor wafer, field-effect transistor, method of producing semiconductor wafer, and method of producing field-effect transistor

Growing community of inventors

Ehime, Japan

Takeshi Aoki