Takayuki Sugisaka is a prominent inventor based in Okazaki, Japan. He has made significant contributions to the field of technology, particularly in the area of thin film resistors. With a total of 10 patents to his name, Sugisaka's work has had a lasting impact on the industry.

Latest Patents

One of Sugisaka's latest patents is a method of etching metallic thin film on thin film resistors. In this innovative process, an aluminum film is formed on a barrier metal covering a thin film resistor to create a first opening. A photo-resist is then applied to the aluminum film and patterned to form a second opening, which has a smaller area than the first opening. This second opening exposes the barrier metal, allowing it to be etched through the smaller opening. This method effectively prevents under-cutting of the barrier metal by ensuring that the etching occurs more from the inner portion than from the opening end of the first opening.

Career Highlights

Throughout his career, Sugisaka has worked with notable companies such as Nippondenso Co., Ltd. and Denso Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in the field of technology.

Collaborations

Sugisaka has collaborated with several talented individuals, including Toshio Sakakibara and Shoji Miura. These collaborations have further enriched his work and have led to advancements in various technological applications.

Conclusion

Takayuki Sugisaka's contributions to the field of technology, particularly through his innovative patents, have established him as a key figure in the industry. His work continues to influence advancements in thin film resistor technology and beyond.

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