The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Jul. 28, 1999
Applicant:
Inventors:

Ichiro Ito, Anjo, JP;

Satoshi Shiraki, Toyohashi, JP;

Tomio Yamamoto, Chiryu, JP;

Makoto Ohkawa, Kariya, JP;

Atsumi Takahashi, Kariya, JP;

Yasuaki Tsuzuki, Anjo, JP;

Akito Fukui, Toyohashi, JP;

Toshio Sakakibara, Nishio, JP;

Takayuki Sugisaka, Okazaki, JP;

Assignee:

Denso Corporation, Kariya, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ; C09K 1/300 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ; C09K 1/300 ;
Abstract

An Al film is formed on a barrier metal covering a thin film resistor to have a first opening. A photo-resist is formed on the Al film and in the opening, and is patterned to have a second opening having an opening area smaller than that of the first opening and open in the first opening to expose the barrier metal therefrom. Then, the barrier metal is etched through the second opening. Because the barrier metal is etched from an inner portion more than the opening end of the first opening, under-cut of the barrier metal is prevented.


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