Tokyo, Japan

Takayuki Dohi


 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2005-2016

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7 patents (USPTO):Explore Patents

Title: Takayuki Dohi: Innovator in Epitaxial Growth Technology

Introduction

Takayuki Dohi is a prominent inventor based in Tokyo, Japan, known for his significant contributions to semiconductor technology. With a total of seven patents to his name, Dohi has made remarkable advancements in the field of epitaxial growth methods.

Latest Patents

Dohi's latest patents include an innovative epitaxial growth method. This method involves growing an epitaxial film on the surface of a semiconductor wafer by mounting the wafer within a susceptor pocket. The process includes supplying source gas and carrier gas to the upper surface side of the susceptor while also supplying carrier gas to the lower surface side. The susceptor is designed with a substantially circular bottom wall and a sidewall that forms a pocket for the wafer. Notably, a plurality of circular through-holes are formed in the bottom wall, allowing for efficient gas flow. The total opening surface area of these through-holes is between 0.05 to 55% of the bottom wall's surface area, with each hole measuring 0.2 to 3.2 mm and a density ranging from 0.25 to 25 per cm. Another significant patent is for an epitaxial wafer and the method of producing it, which includes surface flattening pretreatment and mirror polishing of the wafer's main surface.

Career Highlights

Throughout his career, Takayuki Dohi has worked with notable companies such as Sumco Corporation and Sumitomo Mitsubishi Silicon Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and epitaxial growth technologies.

Collaborations

Dohi has collaborated with esteemed colleagues, including Masayuki Ishibashi and Shinji Nakahara. Their joint efforts have further advanced the field of semiconductor technology.

Conclusion

Takayuki Dohi's innovative work in epitaxial growth methods has significantly impacted the semiconductor industry. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing. Dohi continues to be a key figure in advancing technology in this vital field.

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