Kyoto, Japan

Takatoshi Yamashita

This inventor holds 19 USPTO granted patents, primarily in Ion Implantation Technology. Top assignees: Nissin Ion Equipment Co., Ltd., Nissin Electric Co., Ltd.. Active years: 2002-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takatoshi Yamashita. Retrieved from https://idiyas.com/inventor/takatoshi-yamashita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 26.3

Average Co-Inventor Count = 1.4

ph-index = 7

Forward Citations = 118(Granted Patents)


Company Filing History:


Years Active: 2002-2014

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Areas of Expertise:
Ion Source
Ion Implanter
Ion Implanting Apparatus
Deflecting Electrode
Beam Correction
Electric Field Lens
Angle Measurement
Particle Implantation
Indium Ion Beam
Deviation Angle
Beam Divergence
Electrostatic Accelerator
19 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Takatoshi Yamashita and His Contributions to Ion Implantation Technologies

Introduction:

Takatoshi Yamashita, a pioneering inventor based in Kyoto, Japan, has made significant strides in the field of ion implantation technologies. With an impressive portfolio of 19 patents, his innovations have played a crucial role in advancing modern semiconductor manufacturing and plasma processing techniques.

Latest Patents:

Takatoshi's latest patents showcase his expertise in creating sophisticated devices for ion sources and implantation systems. One notable patent focuses on a repeller structure in a plasma generating chamber, designed to reflect ions toward a cathode, enhancing the efficiency of ionization processes. This innovative structure includes a sputtering target that emits specific ions, providing enhanced control over the ion generation process.

Another recent patent pertains to an ion implanting apparatus featuring an electrostatic accelerating tube that manipulates ion beams with precision. The design incorporates deflecting electrodes configured to apply different electric potentials, allowing for greater control over the ion beam's trajectory when targeting a substrate.

Career Highlights:

During his career, Takatoshi Yamashita has made substantial contributions while working at prominent companies such as Nissin Ion Equipment Co., Ltd. and Nissin Electric Co., Ltd. His work has consistently focused on enhancing ion implantation techniques, which are pivotal in the semiconductor industry.

Collaborations:

Takatoshi has collaborated with esteemed colleagues such as Tadashi Ikejiri and Tetsuya Igo, further enriching the field with their collective expertise. Their teamwork has led to innovative solutions and advancements, bolstering the effectiveness of ion implantation processes.

Conclusion:

With 19 patents to his name, Takatoshi Yamashita has established himself as a key inventor in the realm of ion implantation technologies. His latest innovations reflect a commitment to pushing the boundaries of what is possible in electronics manufacturing, making a lasting impact on the industry. As technology continues to evolve, Takatoshi's contributions will undoubtedly remain influential in shaping the future of semiconductor technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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