The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
May. 17, 2007
Takatoshi Yamashita, Kyoto, JP;
Takatoshi Yamashita, Kyoto, JP;
Nissin Ion Equipment Co., Ltd., Kyoto, JP;
Abstract
An ion source is provided that can generate an ion beam in which the width is wide, the beam current is large, and the uniformity of the beam current distribution in the width direction is high, and that can prolong the lifetime of a cathode. The ion sourcehas: a plasma generating chamberhaving an ion extraction portextending in the X direction; a magnetwhich generates a magnetic fieldextending along the X direction, in the plasma generating chamber; indirectly-heated cathodeswhich are placed respectively on the both sides of the plasma generating chamberin the X direction, and which are used for generating a plasma iin the chamber, and increasing or decreasing the density of the whole of the plasma; and plural filament cathodeswhich are juxtaposed in the X direction in the plasma generating chamberand which are used for generating the plasma iin the chamber, and controlling the density distribution of the plasma