Takashi Kitsuregawa

Title: Takashi Kitsuregawa: Innovator in Semiconductor Technology

Introduction

Takashi Kitsuregawa is a prominent inventor based in Nishinomiya, Japan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is for a vertical type field effect transistor. This invention includes highly doped source, gate, and drain regions that are strategically placed on the main opposite faces of a semiconductor substrate. The design allows for at least one of the regions to be divided into elongated slender portions, with metallic electrodes in ohmic contact, enhancing the transistor's performance. Another notable patent is for an epitaxial deposition process for producing an electrostatic induction thyristor. This process involves creating a semiconductor substrate of the first conductivity type and forming a second semiconductor layer of a different conductivity type. The layers are designed to create charge depletion regions, which are crucial for the thyristor's operation, allowing it to switch between conductive and blocking states effectively.

Career Highlights

Throughout his career, Takashi has worked with esteemed organizations such as the Semiconductor Research Foundation and Mitsubishi Electric Corporation. His work in these companies has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Takashi has collaborated with notable individuals in the field, including Jun-ichi Nishizawa and Kentaro Nakamura. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation.

Conclusion

Takashi Kitsuregawa's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in electronics and semiconductor applications.