Yamanashi, Japan

Takashi Horiuchi

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 120(Granted Patents)


Location History:

  • Nakakoma-Gun, JP (1998)
  • Yamanashi-ken, JP (1998 - 2002)
  • Kai, JP (2010)
  • Yamanashi, JP (2014 - 2015)

Company Filing History:


Years Active: 1998-2025

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10 patents (USPTO):Explore Patents

Title: Takashi Horiuchi: Innovator in Substrate Processing Technology

Introduction

Takashi Horiuchi is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 10 patents. His innovative work has led to advancements in apparatuses and methods for transporting and processing substrates.

Latest Patents

Horiuchi's latest patents include an apparatus for transporting substrates, a system for processing substrates, and a method of transporting substrates. The apparatus comprises an end effector with a fork that holds the substrate and a wrist part that supports the proximal end of the fork. It features an arm with the end effector installed and a mechanism that moves the fork. Additionally, an inclination adjusting mechanism is provided to adjust the fork's angle. The substrate processing method involves transferring unprocessed substrates to a first substrate holder, performing a preset process on the substrates, and unloading the processed substrates in a systematic manner.

Career Highlights

Horiuchi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in enhancing the efficiency and effectiveness of substrate processing technologies.

Collaborations

Horiuchi collaborates with notable coworkers, including Takeshi Kaizuka and Masami Mizukami. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Takashi Horiuchi's contributions to substrate processing technology exemplify his dedication to innovation and excellence in the field. His patents and collaborative efforts continue to shape the future of substrate processing.

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