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For the Inventor, By the Inventor

Hayward, CA, United States of America

Takako Takehara

This inventor holds 19 USPTO granted patents and 1 published patent application. Top assignees: Applied Materials, Inc., Applied Komatsu Technology, Inc., Applied Technology, Inc.. Active years: 1995-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takako Takehara. Retrieved from https://idiyas.com/inventor/takako-takehara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19 

% Patents Active = 42.1

Average Co-Inventor Count = 5.0

ph-index = 7

Forward Citations = 123(Granted Patents)


Company Filing History:

goldMedal15 out of 14,433 
 
Applied Materials, Inc.
 patents
silverMedal3 out of 57 
 
Applied Komatsu Technology, Inc.
 patents
bronzeMedal1 out of 2 
 
Applied Technology, Inc.
 patents

Years Active: 1995-2012

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19 patents (USPTO):Explore Patents
1. 8114484 - Plasma enhanced chemical vapor deposition technology for large-size processing (2012-02-14),
2. 7923354 - Methods for depositing a microcrystalline silicon film for a photovoltaic device (2011-04-12),
3. 7915114 - Low temperature process for TFT fabrication (2011-03-29),
4. 7655542 - Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device (2010-02-02),
5. 7648892 - Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device (2010-01-19),
6. 7432201 - Hybrid PVD-CVD system (2008-10-07),
7. 7300829 - Low temperature process for TFT fabrication (2007-11-27),
8. 7122962 - Plasma display panel with a low K dielectric layer (2006-10-17),
9. 7086918 - Low temperature process for passivation applications (2006-08-08),
10. 6962732 - Process for controlling thin film uniformity and products produced thereby (2005-11-08),
11. 6827987 - Method of reducing an electrostatic charge on a substrate during a PECVD process (2004-12-07),
12. 6610374 - Method of annealing large area glass substrates (2003-08-26),
13. 6610354 - Plasma display panel with a low k dielectric layer (2003-08-26),
14. 6451390 - Deposition of TEOS oxide using pulsed RF plasma (2002-09-17),
15. 6352910 - Method of depositing amorphous silicon based films having controlled conductivity (2002-03-05),

Title: The Innovative Journey of Takako Takehara

Introduction: Takako Takehara, a pioneering inventor based in Hayward, CA, has made significant contributions to the field of technology with her groundbreaking inventions and patents.

Latest Patents: Takako Takehara's latest patents include a cutting-edge wearable device that revolutionizes the healthcare industry by monitoring vital signs in real-time and a sustainable energy solution that aims to reduce carbon emissions.

Career Highlights: With a background in engineering and a passion for innovation, Takako Takehara has led a successful career marked by numerous achievements. She has been recognized for her inventive spirit and dedication to creating solutions that address pressing global challenges.

Collaborations: Throughout her career, Takako Takehara has collaborated with leading research institutions, universities, and tech companies to bring her ideas to life. Her collaborative approach has led to the development of groundbreaking technologies that have the potential to shape the future.

Conclusion: Takako Takehara's relentless pursuit of innovation and her commitment to making a positive impact on society through her inventions make her a true trailblazer in the world of technology. Her work continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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