Urayasu, Japan

Takako Kimura

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignees: L'air Liquide, Societe Anonyme a Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude, Kabushiki Kaisha Toshiba, L'air Liquide. Active years: 2004-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takako Kimura. Retrieved from https://idiyas.com/inventor/takako-kimura-lqhkhqga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5 

% Patents Active = 20.0

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 103(Granted Patents)


Location History:

  • Ibaraki Prefecture, JP (2004)
  • Ibaraki, JP (2007 - 2008)
  • Urayasu, JP (2011 - 2013)

Company Filing History:


Years Active: 2004-2013

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Takako Kimura: Innovator in Silicon Nitride Film Production

Introduction

Takako Kimura is a prominent inventor based in Urayasu, Japan. She has made significant contributions to the field of materials science, particularly in the production of silicon nitride films. With a total of 5 patents to her name, her work has advanced the technology used in various applications.

Latest Patents

One of her latest patents is a method for producing silicon nitride films. The problem addressed by this invention is the need for a vapor deposition method that utilizes trisilylamine as a precursor. This method aims to produce silicon nitride films that exhibit excellent properties at relatively low temperatures and high growth rates. The solution involves feeding gaseous trisilylamine and a nitrogen source, which includes at least two amine-type compounds, into a reaction chamber to form the silicon nitride film on a substrate.

Another notable patent is a method of cleaning a film-forming apparatus. This method is designed to remove silicon-based materials deposited on the apparatus after forming thin films. It includes introducing a first gas containing fluorine and a second gas with carbon monoxide into the apparatus while heating the constituent member, which may include quartz or silicon carbide.

Career Highlights

Throughout her career, Takako Kimura has worked with several notable companies, including Air Liquide and Société Anonyme à Directoire et Conseil de Surveillance pour l'Étude et l'Exploitation des Procédés Georges Claude. Her experience in these organizations has contributed to her expertise in the field of film production technologies.

Collaborations

Takako has collaborated with esteemed colleagues such as Christian Dussarrat and Jean-Marc Girard. These partnerships have further enriched her research and development efforts.

Conclusion

Takako Kimura's innovative work in the production of silicon nitride films and her contributions to cleaning methods for film-forming apparatuses highlight her significant role in advancing materials science. Her patents reflect her commitment to improving technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…