The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
May. 17, 2002
Jean-Marc Girard, Paris, FR;
Takako Kimura, Ibaraki Prefecture, JP;
Abstract
To provide a process gas supply mechanism for ALCVD systems that enables the high speed switching of process gases without accompanying particulate contamination of the treatment substrate. The ALCVD system is provided with a CVD treatment section and a process gas supply section. The process gas supply section contains a reactant gas line and a carrier gas line; these are combined to form a joint flow line. A vent line is connected to the reactant gas line upstream from the joint flow position. A stop valve SV and a needle valve NV are disposed in the vent line. This needle valve NV functions as a setting means in order to set the flow rate of the gas flowing in the vent line. The stop valve SV is driven through repetitive switching operations by a drive control element, thereby effecting supply and nonsupply of the reactant gas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile