The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Sep. 26, 2005
Naoki Tamaoki, Tokyo, JP;
Yuusuke Sato, Tokyo, JP;
Jun Sonobe, Tsukuba, JP;
Takamitsu Shigemoto, Tsukuba, JP;
Takako Kimura, Urayasu, JP;
Naoki Tamaoki, Tokyo, JP;
Yuusuke Sato, Tokyo, JP;
Jun Sonobe, Tsukuba, JP;
Takamitsu Shigemoto, Tsukuba, JP;
Takako Kimura, Urayasu, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
L'Air Liquide, Paris, FR;
Abstract
A method of cleaning a film-forming apparatus to remove a silicon-based material deposited on a constituent member of the film-forming apparatus after being used to form thin films includes introducing a first gas including fluorine gas and a second gas including carbon monoxide gas into the film-forming apparatus, and heating the constituent member. The constituent member includes quartz or silicon carbide and the silicon-based material includes silicon nitride, or the constituent member includes silicon carbide and the silicon-based material includes silicon oxide.