Nagoya, Japan

Takahiro Ishikawa

This inventor holds 32 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Material Bonding Techniques. Top assignees: Ngk Insulators, Inc., Denso Corporation, Kyushu University. Active years: 2002-2026.

USPTO Granted Patents = 32 

% Patents Active = 56.3

 

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 192(Granted Patents)


Location History:

  • Anjo, JP (2006)
  • Pittsburgh, PA (US) (2007)
  • Nagoya, JP (2002 - 2015)
  • Kariya, JP (2020)
  • Toyoake, JP (2004 - 2023)

Company Filing History:


Years Active: 2002-2026

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Areas of Expertise:
Occupant Imaging Device
Copper Alloy Assembly
Beryllium Copper Alloy
Driving Assistance Device
Heat Spreader Module
Field Recognition Apparatus
Adaptive Image Processing
Composite Material Production
Nitriding Process
Electronic Circuit Member
Action Estimating Apparatus
Laminated Radiation Member
32 patents (USPTO):Explore Patents

Title: Takahiro Ishikawa: Pioneering Inventor from Nagoya

Introduction: Takahiro Ishikawa is a renowned inventor hailing from Nagoya, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ishikawa holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Ishikawa has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Ishikawa has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Takahiro Ishikawa's dedication to pushing the boundaries of technology and his passion for creating solutions that make a difference have solidified his reputation as a visionary inventor in Nagoya and beyond.

Profile summary based on public USPTO records.
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