Tokyo, Japan

Takahiro Hiromatsu


Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2020

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5 patents (USPTO):

Title: Takahiro Hiromatsu: Innovator in Mask Technology

Introduction

Takahiro Hiromatsu is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of mask technology, particularly in the development of innovative mask blanks that enhance manufacturing processes. With a total of 5 patents to his name, Hiromatsu's work is recognized for its technical sophistication and practical applications.

Latest Patents

Hiromatsu's latest patents include a mask blank having a resist layer, a method for manufacturing a mask blank with a resist layer, and a method for manufacturing a transfer mask. The mask blank is designed to suppress charge-up during electron beam irradiation. It consists of a substrate with a thin film, a resist layer on the thin film's surface, and a conductive layer on the resist layer. The conductive layer features a first metal layer primarily composed of aluminum and a second metal layer made of a different metal. Additionally, his patents describe a mask blank that includes a thin film for forming a transfer pattern, a resist underlayer made from a specific polymer composition, and a mixed film interposed between the resist underlayer and the resist film.

Career Highlights

Throughout his career, Takahiro Hiromatsu has worked with notable companies such as Hoya Corporation and Nissan Chemical Industries Limited. His experience in these organizations has allowed him to refine his expertise in mask technology and contribute to advancements in the field.

Collaborations

Hiromatsu has collaborated with several professionals in his field, including Masahiro Hashimoto and Yasushi Sakaida. These collaborations have fostered innovation and the sharing of ideas, further enhancing the development of new technologies.

Conclusion

Takahiro Hiromatsu is a distinguished inventor whose work in mask technology has led to significant advancements in manufacturing processes. His innovative patents and collaborations reflect his commitment to pushing the boundaries of technology.

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