The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Aug. 25, 2015
Hoya Corporation, Tokyo, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Takahiro Hiromatsu, Tokyo, JP;
Masahiro Hashimoto, Tokyo, JP;
Yasushi Sakaida, Toyama, JP;
Ryuta Mizuochi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Masaki Nagai, Tokyo, JP;
HOYA CORPORATION, Tokyo, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
There is provided a mask blank including on a substrate: a thin film for forming a transfer pattern; a resist underlayer formed on the thin film and made of a resist underlayer composition containing a polymer having a unit structure having a lactone ring and a unit structure having a hydroxyl group; a resist film formed on the resist underlayer film and made of a resist composition; and a mixed film formed so as to be interposed between the resist underlayer film and the resist film and made of a mixed component containing the resist underlayer composition and the resist composition.