Miyagi, Japan

Takaharu Miyadate

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2020-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takaharu Miyadate. Retrieved from https://idiyas.com/inventor/takaharu-miyadate

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):Explore Patents

Title: Takaharu Miyadate: Innovator in Plasma Processing Technology

Introduction

Takaharu Miyadate is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work has been instrumental in advancing the capabilities of substrate processing apparatuses.

Latest Patents

Miyadate's latest patents include a plasma processing apparatus and a substrate processing apparatus. The plasma processing apparatus features a table with a wafer support and a peripheral segment that has through-holes. This design allows for improved processing efficiency. The substrate processing apparatus includes a process chamber and a stage for placing substrates, along with a focus ring that enhances the precision of the processing.

Career Highlights

Miyadate is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative designs and patents have contributed to the company's reputation for excellence in technology.

Collaborations

Miyadate has collaborated with notable coworkers such as Shuichi Takahashi and Takashi Taira. Their combined expertise has fostered a productive environment for innovation and development.

Conclusion

Takaharu Miyadate's contributions to plasma processing technology exemplify the impact of dedicated inventors in advancing industrial capabilities. His patents reflect a commitment to innovation that continues to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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