The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2022
Filed:
Mar. 20, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shuichi Takahashi, Miyagi, JP;
Takaharu Miyadate, Miyagi, JP;
Takanori Banse, Miyagi, JP;
Joji Takayoshi, Miyagi, JP;
Rumiko Moriya, Miyagi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/32091 (2013.01); H01L 21/67069 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H01L 21/68735 (2013.01); H01L 21/68742 (2013.01); H01L 21/68785 (2013.01); H01J 2237/334 (2013.01); H01L 21/67109 (2013.01);
Abstract
A substrate processing apparatus includes a process chamber, a stage that is disposed in the process chamber and on which a substrate is placeable, a moving mechanism, and a focus ring. The focus ring is disposed on the stage and includes an inner focus ring disposed close to the substrate placed on the stage, a middle focus ring that is disposed outside of the inner focus ring and is movable in a vertical direction by the moving mechanism, and an outer focus ring that is disposed outside of the middle focus ring.