Rumiko Moriya

Title: Rumiko Moriya: Innovator in Substrate Processing Technology

Introduction

Rumiko Moriya is a prominent inventor based in Miyagi, Japan. She has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. Her work focuses on enhancing the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

One of her latest patents is a "Substrate Processing Apparatus." This apparatus includes a process chamber, a stage for placing substrates, a moving mechanism, and a focus ring. The focus ring is designed with an inner focus ring positioned close to the substrate, a middle focus ring that can move vertically, and an outer focus ring surrounding the middle one. This innovative design aims to improve the precision of substrate processing.

Another notable patent is the "Method for Driving Member and Processing Apparatus." This method involves irradiating a member in a processing chamber with measurement light, detecting the intensity distribution of reflected light, and calculating the optical path difference using Fourier transform. The driving amount of the member is then determined based on this optical path difference, allowing for precise control in processing applications.

Career Highlights

Rumiko Moriya is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her role involves developing advanced technologies that contribute to the efficiency of substrate processing.

Collaborations

Throughout her career, she has collaborated with notable colleagues, including Takanori Banse and Shuichi Takahashi. These collaborations have further enhanced her innovative contributions to the field.

Conclusion

Rumiko Moriya's work in substrate processing technology exemplifies her commitment to innovation and excellence. Her patents reflect her expertise and dedication to advancing the industry.