TaiMin Chang

Title: The Innovations of TaiMin Chang

Introduction

TaiMin Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure that enhances device performance.

Latest Patents

TaiMin Chang holds a patent for a semiconductor structure and method of forming the same. This patent describes a semiconductor device that includes a gate structure on a semiconductor fin, a dielectric layer on the gate structure, and a gate contact extending through the dielectric layer to the gate structure. The gate contact comprises a first conductive material on the gate structure, with a top surface of the first conductive material extending between the sidewalls of the dielectric layer, and a second conductive material on the top surface of the first conductive material. This innovation is crucial for advancing semiconductor device efficiency.

Career Highlights

TaiMin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Kan-Ju Lin and Chien Chang. Their collective expertise contributes to the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

TaiMin Chang's contributions to semiconductor technology exemplify the spirit of innovation. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key player in advancing the industry.