Taiwan Semiconductor Manufacturing Comp. Ltd.

TaiMin Chang

Lin-Yu Huang

Ming-Hsing Tsai

Hung-Yi Huang

Chih-wei Chang

Chien Chang

Kan-Ju Lin

Chih-Shiun Chou

A semiconductor device includes a gate structure on a semiconductor fin, a dielectric layer on the gate structure, and a gate contact extending through the dielectric layer to the gate structure. The gate contact includes a first conductive material on the gate structure, a top surface of the first conductive material extending between sidewalls of the dielectric layer, and a second conductive material on the top surface of the first conductive material.

Semiconductor structure and method of forming the same

Growing community of inventors

Taipei, Taiwan

TaiMin Chang