Company Filing History:
Years Active: 2020-2025
Title: Taiki Kato: Innovator in Semiconductor Technology
Introduction
Taiki Kato is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative approaches have paved the way for advancements in film formation methods and semiconductor device manufacturing.
Latest Patents
One of Taiki Kato's latest patents is focused on selective film formation using a self-assembled monolayer. This method involves preparing a substrate with distinct regions, where a self-assembled monolayer is formed in a specific area by supplying an organic compound. This technique allows for the selective adsorption of the organic compound, leading to the formation of an insulating film in another region while inhibiting film formation in the area with the self-assembled monolayer.
Another notable patent is a method for manufacturing a semiconductor device that includes a titanium nitride (TiN) film. This method comprises several cycles of supplying and purging gases, including TiCl and NH, while using an inhibitor to control the adsorption process on the substrate. This innovative approach enhances the efficiency and effectiveness of semiconductor device manufacturing.
Career Highlights
Taiki Kato is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his inventive skills to real-world applications, contributing to the advancement of semiconductor technologies.
Collaborations
Throughout his career, Taiki Kato has collaborated with notable colleagues, including Zeyuan Ni and Akitaka Shimizu. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Taiki Kato's contributions to semiconductor technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His inventive methods and collaborative efforts continue to influence advancements in semiconductor manufacturing.