This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2021-2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021-2023
Title: Taichi Okano: Innovator in Plasma Processing Technology
Introduction
Taichi Okano is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Okano's latest patents include a "Processing method and plasma processing apparatus" and a "Target object processing method and plasma processing apparatus." The first patent describes a method of processing an object using a plasma processing apparatus, which includes a stage for placing the object in a chamber, an outer peripheral member, and a first power supply for applying voltage. This method involves exposing the object to plasma containing a precursor with deposition properties while monitoring and controlling the voltage based on the deposition film's status. The second patent outlines a method for processing a target object with an etching target film and a patterned mask, utilizing a plasma processing apparatus to achieve precise results.
Career Highlights
Taichi Okano is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has positioned him as a key player in advancing plasma processing technologies.
Collaborations
Okano has collaborated with notable coworkers, including Seiji Yokoyama and Shunichi Kawasaki. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.
Conclusion
Taichi Okano's contributions to plasma processing technology demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in plasma processing, making him a valuable asset to the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
