Tai-Peng Lee

Title: Innovations of Inventor Tai-Peng Lee

Introduction

Tai-Peng Lee is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of integrated circuit fabrication, holding a total of 7 patents. His work has advanced the technology used in semiconductor manufacturing processes.

Latest Patents

Among his latest patents, one focuses on the use of TEOS oxides in integrated circuit fabrication processes. This patent describes a method for manufacturing a low-temperature removable silicon dioxide hard mask for patterning and etching, utilizing tetra-ethyl-ortho-silane (TEOS) for the deposition of the silicon dioxide hard mask. Another significant patent involves the use of chlorine to fabricate trench dielectric in integrated circuits. In this innovation, chlorine is incorporated into the pad oxide formed on a silicon substrate before etching substrate isolation trenches. This incorporation enhances the rounding of the top corners of the trenches when a silicon oxide liner is thermally grown on the trench surfaces.

Career Highlights

Throughout his career, Tai-Peng Lee has worked with several companies, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His expertise in semiconductor technology has made him a valuable asset in these organizations.

Collaborations

Tai-Peng has collaborated with notable coworkers such as Chuck Jang and Barbara Haselden, contributing to various projects in the semiconductor industry.

Conclusion

Tai-Peng Lee's innovations in integrated circuit fabrication have significantly impacted the semiconductor industry. His patents reflect a deep understanding of materials and processes that enhance manufacturing efficiency.