Taek Dong Chung

Title: Taek Dong Chung: Innovator in PDMS Devices and Ionic Transistors

Introduction

Taek Dong Chung is a prominent inventor based in Gwacheon-si, South Korea. He has made significant contributions to the field of materials science and engineering, particularly in the development of innovative devices. With a total of 8 patents to his name, Chung's work has garnered attention for its practical applications and technological advancements.

Latest Patents

Chung's latest patents include a method for manufacturing PDMS devices and an open-junction ionic transistor. The method for manufacturing a PDMS device involves surface treating the entire surface of a pattern with a thiol group (—SH). This allows a hydrogel to be connected to the surface of the pattern by a covalent bond under ultraviolet rays. The resulting PDMS device maintains its shape stably without swelling or desorption of the hydrogel, even when an electrolyte is filled in the pattern. The open-junction ionic transistor features a substrate with a p-type gel and an n-type gel, both formed as polyelectrolyte gels. This innovative design includes reservoirs and an encapsulation layer, allowing for amplified ionic current peaks when a reverse bias voltage is applied.

Career Highlights

Throughout his career, Taek Dong Chung has worked with esteemed organizations such as Seoul National University and Samsung Electronics. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research and development in his field.

Collaborations

Chung has collaborated with notable colleagues, including Young-chang Joo and Jeong-Yun Sun. These partnerships have facilitated the exchange of ideas and fostered innovation in their respective projects.

Conclusion

Taek Dong Chung's contributions to the field of PDMS devices and ionic transistors highlight his role as a leading inventor. His innovative methods and collaborative efforts continue to push the boundaries of technology and materials science.