Tae Seok Byun

Title: Tae Seok Byun: Innovator in Thin Film Technology

Introduction

Tae Seok Byun is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His innovative work focuses on developing advanced materials and methods for depositing thin films, which are essential in various technological applications.

Latest Patents

One of his latest patents is for an iodine-containing metal compound and composition for depositing thin films. This invention provides an iodine-containing metal compound and a method for manufacturing a metal-containing thin film. The composition is in a liquid state at room temperature, offering excellent storage and handling properties. Its high reactivity allows for efficient formation of metal thin films.

Another notable patent is for a novel silylcyclodisilazane compound and a method for manufacturing silicon-containing thin films. This compound exhibits high reactivity, thermal stability, and high volatility, making it an effective silicon-containing precursor. It enables the production of high-quality silicon-containing thin films through various deposition methods.

Career Highlights

Tae Seok Byun has worked with reputable companies such as DNF Co., Ltd. and SKC Co., Ltd. His experience in these organizations has contributed to his expertise in thin film technology and material science.

Collaborations

Throughout his career, Tae Seok Byun has collaborated with notable colleagues, including Sang Ick Lee and Yong Hee Kwone. These collaborations have further enhanced his research and development efforts in the field.

Conclusion

Tae Seok Byun is a distinguished inventor whose work in thin film technology has led to significant advancements in the industry. His innovative patents and collaborations reflect his commitment to pushing the boundaries of material science.