Tae Hee Yoo

Title: Tae Hee Yoo: Innovator in Semiconductor Technology

Introduction

Tae Hee Yoo is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on methods and devices that enhance substrate processing and thin film deposition.

Latest Patents

One of his latest patents is a substrate processing method and device designed to prevent the non-uniformity of thickness in landing pads deposited on vertical NAND devices with a stepped structure. This innovative method involves stacking multiple layers, including insulating and sacrificial layers, and etching them to create a stepped structure. The process also includes forming a barrier layer and a mask layer, followed by a series of etching steps to achieve the desired structure.

Another notable patent is a method of depositing thin films on semiconductor substrates. This method includes the sequential supply of source gas, reactive gas, and plasma, with a high frequency of 60 MHz or greater. This technique allows for precise control over the thickness of the deposited film, which is crucial for semiconductor manufacturing.

Career Highlights

Tae Hee Yoo is currently employed at ASM IP Holding B.V., a company known for its advanced semiconductor manufacturing equipment. His expertise in substrate processing and thin film deposition has positioned him as a key player in the industry.

Collaborations

He has collaborated with notable colleagues, including Yong Min Yoo and Yoon Ki Min, who contribute to the innovative environment at ASM IP Holding B.V. Their combined efforts enhance the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Tae Hee Yoo's contributions to semiconductor technology through his patents and work at ASM IP Holding B.V. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.