Tadashi Ohashi

Title: The Innovative Contributions of Tadashi Ohashi

Introduction

Tadashi Ohashi is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work has advanced the methods and apparatuses used in the growth of thin films on semiconductor substrates.

Latest Patents

One of his latest patents is the Barrel Type Susceptor, which is designed for use in semiconductor epitaxial growth. This innovative susceptor features a face plate shaped like a truncated cone, partitioned into multiple sections. Each section includes a wafer mounting concave portion, with the inclination angle of the bottom face gradually decreasing from the upper part to the lower part. Another notable patent is the Method of Chemically Growing a Thin Film in a Gas Phase on a Silicon Semiconductor Substrate. This method utilizes a rotary gaseous phase thin film growth apparatus that feeds material gas from above to a rotating silicon substrate. The process employs monosilane gas under reduced pressure and specific temperature conditions to effectively grow thin films.

Career Highlights

Throughout his career, Tadashi Ohashi has worked with notable companies, including Toshiba Ceramics Co., Ltd. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that have practical applications in various electronic devices.

Collaborations

Ohashi has collaborated with esteemed colleagues such as Shinichi Mitani and Takaaki Honda. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Tadashi Ohashi's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to influence the industry and pave the way for future advancements.