Ta Hung Yang

Title: The Innovations of Ta Hung Yang

Introduction

Ta Hung Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the reliability and efficiency of semiconductor interconnect structures.

Latest Patents

One of his latest patents is titled "Inverted-T shaped via for reducing adverse stress-migration effects." This invention involves a semiconductor interconnect structure formed as a via with an inverted-T shape, which increases the reliability of the interface between the interconnect structure and an underlying electrically conductive layer, such as copper. The design effectively increases the bottom critical dimension of the via, thereby reducing or eliminating degradation caused by voids in the conductive layer during high-temperature or stress-migration baking.

Another notable patent is the "Method of word-line formation by semi-damascene process with thin protective conductor layer." This semi-damascene method allows for the fabrication of wordlines without stringers while maintaining critical cell dimensions when the wordline pitch is less than 40 nm. A thin conducting layer protects a storage layer during manufacture, ensuring that the filled-in conducting material makes proper contact.

Career Highlights

Ta Hung Yang is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technologies. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more reliable and efficient.

Collaborations

He has collaborated with notable coworkers, including Been Yih Jin and Daniel L Yen, contributing to various projects that enhance semiconductor technology.

Conclusion

Ta Hung Yang's contributions to the field of semiconductor technology through his innovative patents demonstrate his commitment to advancing the industry. His work not only improves the reliability of semiconductor devices but also sets a foundation for future innovations.