Hsinchu, Taiwan

Ta-Cheng Lin

This inventor holds 2 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2013-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ta-Cheng Lin. Retrieved from https://idiyas.com/inventor/ta-cheng-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Ta-Cheng Lin: Innovator in ESD Protection Devices

Introduction

Ta-Cheng Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electronics, particularly in the development of ESD protection devices. With a total of 2 patents to his name, Lin continues to push the boundaries of innovation in his industry.

Latest Patents

One of Lin's latest patents is an ESD protection device having reduced equivalent capacitance. This device includes a substrate of a first conductivity type, a well region of a second conductivity type, and multiple doped regions configured to enhance its functionality. The design aims to improve the efficiency and reliability of electronic devices by minimizing the impact of electrostatic discharge.

Another notable patent is the lateral silicon controlled rectifier structure. This structure features a P-type substrate and an N-well region, along with various doped regions that work together to create a robust electronic component. The gate structure in this design plays a crucial role in controlling the flow of electricity, making it a valuable innovation in power management.

Career Highlights

Ta-Cheng Lin is currently employed at United Microelectronics Corporation, a leading semiconductor company. His work at this organization has allowed him to collaborate with other talented professionals in the field. His contributions have been instrumental in advancing the company's technological capabilities.

Collaborations

Lin has worked alongside notable colleagues such as Te-Chang Wu and Chien-Kuo Wang. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Ta-Cheng Lin's work in the field of ESD protection devices exemplifies his commitment to innovation and excellence. His patents reflect a deep understanding of electronic design and a dedication to improving device performance. As he continues to develop new technologies, Lin remains a key figure in the advancement of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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