IDiyas

For the Inventor, By the Inventor

Tokyo, Japan

Susumu Tsuzuku

USPTO Granted Patents = 12

Average Co-Inventor Count = 6.1

ph-index = 8

Forward Citations = 186(Granted Patents)


Location History:

  • Tokyo-to, JP (1998)
  • Tokyo, JP (1982 - 2001)

Company Filing History:

goldMedal12 out of 42,485 
 
Hitachi, Ltd.
 patents

Years Active: 1982-2001

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12 patents (USPTO):Explore Patents
1. 6171641 - Vacuum processing apparatus, and a film deposition apparatus and a film deposition method both using the vacuum processing apparatus (2001-01-09),
2. 5815396 - Vacuum processing device and film forming device and method using same (1998-09-29),
3. 5707500 - Vacuum processing equipment, film coating equipment and deposition method (1998-01-13),
4. 5670421 - Process for forming multilayer wiring (1997-09-23),
5. 5498768 - Process for forming multilayer wiring (1996-03-12),
6. 4830891 - Method for selective deposition of metal thin film (1989-05-16),
7. 4478902 - Screen for projection television (1984-10-23),
8. 4473662 - Catalyst and composition for producing polyurethane foam (1984-09-25),
9. 4444704 - Process for producing integral skin polyurethane foam (1984-04-24),
10. 4426341 - Transfer molding method and transfer molding machine (1984-01-17),
11. 4409341 - Composition for fire retardant urethane foam (1983-10-11),
12. 4342842 - Process for producing rigid polyurethane foam (1982-08-03),

Title: Susumu Tsuzuku: Innovator in Vacuum Processing Technology

Introduction

Susumu Tsuzuku is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of vacuum processing technology, holding a total of 12 patents. His work focuses on improving the efficiency and effectiveness of film deposition processes, which are crucial in various manufacturing applications.

Latest Patents

Tsuzuku's latest patents include a vacuum processing apparatus and a film deposition apparatus, along with a film deposition method that utilizes the vacuum processing apparatus. The vacuum processing apparatus is designed to perform various processes on a wafer within a vacuum chamber. Notably, the film deposition method and apparatus are characterized by their ability to control the temperature of the wafer during the deposition process. This innovation involves emissivity calibration using a combination of a temperature calibration stage and a shutter, ensuring precise temperature control during film deposition.

Career Highlights

Throughout his career, Tsuzuku has been associated with Hitachi, Ltd., where he has played a vital role in advancing vacuum processing technologies. His inventions have significantly impacted the semiconductor manufacturing industry, enhancing the quality and reliability of film deposition processes.

Collaborations

Tsuzuku has collaborated with notable colleagues, including Eisuke Nishitani and Shigeru Kobayashi. Their combined expertise has contributed to the development of innovative solutions in the field of vacuum processing.

Conclusion

Susumu Tsuzuku's contributions to vacuum processing technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to advancing manufacturing processes, making him a key figure in the industry.

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