The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 1998
Filed:
Jun. 06, 1995
Hideaki Shimamura, Yokohama, JP;
Yuji Yoneoka, Yokohama, JP;
Shigeru Kobayashi, Hiratsuka, JP;
Satosi Kisimoto, Yokohama, JP;
Sunao Matsubara, Tokorozawa, JP;
Hiroyuki Shida, Koganei, JP;
Yukio Tanigaki, Tachikawa, JP;
Masashi Yamamoto, Yamanashi-ken, JP;
Susumu Tsuzuku, Tokyo-to, JP;
Eisuke Nishitani, Yokohama, JP;
Tokio Kato, Tokyo-to, JP;
Akira Okamoto, Chigasaki, JP;
Hitachi, Ltd, Tokyo, JP;
Abstract
The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.