Company Filing History:
Years Active: 1990-2001
Title: Innovations of Yuji Yoneoka
Introduction
Yuji Yoneoka is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of vacuum processing technology. With a total of 4 patents to his name, Yoneoka has focused on advancements that enhance the efficiency and effectiveness of film deposition processes.
Latest Patents
Yoneoka's latest patents include a vacuum processing apparatus and a film deposition apparatus, along with a film deposition method that utilizes the vacuum processing apparatus. The vacuum processing apparatus is designed to perform various processes on a wafer within a vacuum chamber. This invention is particularly characterized by its ability to control the temperature of the wafer during the film deposition process. After performing emissivity calibration using a combination of a temperature calibration stage and a shutter, the substrate is transferred to stages in a vacuum film deposition process chamber. A film is then deposited on the substrate by maintaining the substrate temperature at a specified level. Additionally, his work on vacuum processing equipment involves radiation measurement and temperature control of the wafer using an infrared radiation thermometer, allowing for precise heating and cooling during processing.
Career Highlights
Yuji Yoneoka is currently employed at Hitachi, Ltd., where he continues to innovate in the field of vacuum processing technology. His work has been instrumental in advancing the capabilities of film deposition methods, which are crucial in various applications, including semiconductor manufacturing.
Collaborations
Yoneoka has collaborated with notable colleagues such as Hideaki Shimamura and Shigeru Kobayashi. Their combined expertise has contributed to the development of advanced technologies in the vacuum processing domain.
Conclusion
Yuji Yoneoka's contributions to vacuum processing technology and film deposition methods highlight his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving efficiency and precision in wafer processing.