Zama, Japan

Susumu Makinouchi

This inventor holds 35 USPTO granted patents, primarily in Exposure Apparatus. Top assignee: Nikon Corporation. Active years: 1989-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Susumu Makinouchi. Retrieved from https://idiyas.com/inventor/susumu-makinouchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 65.7

Average Co-Inventor Count = 1.5

ph-index = 14

Forward Citations = 416(Granted Patents)


Location History:

  • Yokohama, JP (1989)
  • Kawasaki, JP (1989 - 1990)
  • Kanagawa-ken, JP (1997)
  • Kanagawa, JP (2002)
  • Zama, JP (1994 - 2014)
  • Tokyo, JP (2001 - 2014)
  • Zuma, JP (2014)

Company Filing History:


Years Active: 1989-2014

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Areas of Expertise:
Exposure Method
Device Fabrication
Encoder Apparatus
Position Measuring
Immersion Exposure
Scanning Exposure
Projection Optical
Motor-Driven Stage
Pattern Formation
Liquid Suppression
Synchronization Error
Damping Force
35 patents (USPTO):Explore Patents

Title: **Susumu Makinouchi: Innovator in Encoder and Exposure Technologies**

Introduction

Susumu Makinouchi, based in Zama, Japan, is a prominent inventor with an impressive portfolio of 35 patents. His work primarily revolves around advanced encoder and exposure technologies, contributing significantly to the field of optical systems and imaging technologies.

Latest Patents

Makinouchi's most recent patents showcase his innovative approach to addressing challenges in detection and imaging. One of them is an **Encoder apparatus using liquid to suppress detection failure**. This invention includes a first scale member with a scale region, a detector for light detection, and a retaining member that holds liquid between its surface and the scale member. This unique design aims to enhance the reliability of detection mechanisms in various applications.

Another notable patent is the **Exposure apparatus, exposure method, and device fabrication method**. This apparatus creates an immersion area by supplying liquid onto a substrate and facilitates the formation of prescribed patterns through this liquid. It also incorporates a spare immersion area that helps prevent liquid separation during the movement between the projection optical system and the substrate surface.

Career Highlights

Makinouchi is currently associated with Nikon Corporation, a leading global company known for its innovations in imaging and precision optics. Throughout his career, he has consistently worked on projects that push the boundaries of technology, leaving a strong mark in his field.

Collaborations

Makinouchi has collaborated with several talented individuals, including Akihiro Watanabe and Toru Imai. These collaborations have fostered an environment of creativity and innovation, allowing them to pool their expertise to develop groundbreaking technologies.

Conclusion

Susumu Makinouchi's contributions to encoder and exposure technologies have made him a significant figure in the field of optics. With numerous patents to his name and ongoing collaboration with esteemed professionals at Nikon Corporation, his work will likely continue to influence future developments in imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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