The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Feb. 02, 2000
Susumu Makinouchi, Zama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A method is provided for transferring a mask pattern on a mask onto each of a plurality of shot areas on a substrate by synchronously moving the mask and the substrate with respect to an exposing radiation flux. The method includes the steps of optimizing run-up distances of the mask and the substrate with respect to each of the plurality of shot areas, determining respective acceleration starting positions for the mask and the substrate for the shot area to be exposed in accordance with the corresponding run-up distances optimized in the step of optimizing, and accelerating the mask and the substrate from the respective acceleration starting positions to respective scanning speeds. The method further includes the steps of maintaining the respective scanning speeds of the mask and the substrate to synchronously move the mask and the photosensitive substrate, and directing the exposing radiation flux towards the mask to project the image of the mask pattern onto the shot area when the mask and the substrate complete respective run-up distances in the step of maintaining.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile