Chigasaki, Japan

Susumu Ikeda

This inventor holds 2 USPTO granted patents. Top assignee: Ulvac, Inc.. Active years: 2011-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Susumu Ikeda. Retrieved from https://idiyas.com/inventor/susumu-ikeda-031h0k6w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.2

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Kanagawa, JP (2011)
  • Chigasaki, JP (2018)

Company Filing History:


Years Active: 2011-2018

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2 patents (USPTO):Explore Patents

Title: Susumu Ikeda: Innovator in Film Formation Technology

Introduction

Susumu Ikeda is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of film formation technology, holding two patents that showcase his innovative approach to creating organic and inorganic layers on substrates. His work is primarily associated with Ulvac, Inc., a company known for its advancements in vacuum technology.

Latest Patents

Ikeda's latest patents include a film formation method and a film formation apparatus. The film formation method involves creating an organic layer made of a fluorine-containing resin on an inorganic layer formed on a substrate. This process utilizes a reactive sputtering procedure with water vapor as a reactive gas to establish the inorganic layer. Following this, the organic layer is applied to the inorganic layer. The film formation device he developed facilitates the implementation of this method. Additionally, his thin film forming apparatus allows for easy fixing and removal of substrates to and from the outer circumferential surface of a drum-type substrate holder, enhancing efficiency in the film deposition process.

Career Highlights

Throughout his career, Susumu Ikeda has demonstrated a commitment to innovation in film formation technology. His patents reflect a deep understanding of the complexities involved in creating high-quality thin films. His work has contributed to advancements in various applications, including electronics and materials science.

Collaborations

Ikeda has collaborated with notable colleagues such as Masashi Kubo and Takashi Yoshida. These partnerships have likely enriched his research and development efforts, leading to the successful creation of his patented technologies.

Conclusion

Susumu Ikeda's contributions to film formation technology through his patents and work at Ulvac, Inc. highlight his role as an influential inventor in the field. His innovative methods and apparatuses continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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